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    现在位置首页>实验室常用设备>制样/消解设备>电子束刻蚀系统> 瑞典Obducat 30Kv TFE, 50Kv TFE电子束刻蚀系统

    商品编号:49580
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    瑞典Obducat 30Kv TFE, 50Kv TFE电子束刻蚀系统

    价    格:询价

    产    地:更新时间:2016/12/19 11:00:40

    品    牌:Obducat型    号:

    状    态:正常点击量:1907

    15110079913
    联系我时,请说明是在来宝网上看到的,谢谢!

    上海富格贸?#23376;?#38480;公司

    联 系 人:郑基荣

    电     话:010-84851463

    传     真:010-84851473

    等     级: (第 11年)

    性     质:贸易型,

    联系我时请说在来宝网上看到的,谢谢!




    1998年Obducat公司并购了在SEM有三十年经验的Camscan,并结合自身在纳米压印设备以及光存储设备的开发经验,研发了电子束刻蚀设备,提供EBR-30kV,EBR-50kV两种不同型号,都配备热场发射电子腔。 技术参数Electron gun /
    Filament type
    Thermal Field Emission (ZrO/C) X/Y Tilt/Shift Magnetic Alignment

    Cathode life
    Typically 10,000 hrs+

    Beam spot size
    Down to 8 nm 30 kV, Down to 2nm 50kV

    Beam current density
    Typically > 1000 A/cm2

    Acceleration voltage
    30 kV or 50kV

    Gun EHT unit
    EHT unit includes Suppressor, Extractor, Lens and Filament supplies

    Condenser lenses
    Integrated E/S Lens in Electron Gun, and Magnetic Condenser Lens

    Objective lens
    One electromagnetic low aberration final probe forming lens

    Stigmator T
    wo Octupole Stigmators, to correct both lens and source astigmatism

    Beam blanker
    Electrostatic blanking plates conjugate to writing plane Bandwidth up to 30 MHz. (tr/tf < 6 ns)

    Dynamic focus
    Iron free coil, ±100 μm range

    Beam current drift
    < ±0.5% / hr with activated beam current feedback system

    Beam apertures
    4 selectable by aperture changer mechanism


    Maximal travel 100 mm
    Drive unit Brush less 3-phase linear motor
    Bearing Cross roller bearing
    Straightness < 5 μm / 50 mm
    Measuring system Integrated laser scale, resolution < 1nm
    Position repeatability < ± 6.4 nm
    Dynamic position error < ± 3.8 nm
    Speed range high resolution 2.5 - 250 μm/s
    Speed range low resolution Up to 5 mm/s

    Rotation Spindle
    Axial rotational error < 0.05 μm
    Radial rotational error < 0.05 μm
    Radial async. rotation error < 0.015 μm ptp
    Rotation speed 1-3000 rpm


    主要特点General:
    Feedback and closed-loop systems guarantees long time exposure stability.
    Fast exposure, High beam current from 1 nA to 30 nA,
    CLV or CAV exposure method,
    Overlay exposure accuracy and DOSE-control,

    Mechanics:
    Linear motor and stage outside of vacuum chamber
    No magnetic/electrostatic or acoustics interference
    Brush less sub systems ensure repeatability
    Rotation stage on air bearing
    Radial async. rotation error less than 15 nm ptp
    ?





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